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Source Publication：Chemical Engineering Journal    Creator：Chengshuai Liu分Chengshuai Liu

Selected(0)Clear Items/Page: 5101520253035404550556065707580859095100   Sort: SelectIssue Date AscendingIssue Date DescendingWOS Cited Times AscendingWOS Cited Times DescendingTitle AscendingTitle DescendingSubmit date AscendingSubmit date DescendingJournal Impact Factor AscendingJournal Impact Factor DescendingAuthor AscendingAuthor Descending
	A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism 期刊论文 Chemical Engineering Journal, 2020, 卷号: 401, 页码: 126102 Authors:  Wei Ding;  Hui Tong;  Dan Zhao;  Huaili Zheng;  Chengshuai Liu;  Jinjun Li;  Feng Wu Adobe PDF(1717Kb)  |  Favorite  |  View/Download：134/0  |  Submit date：2021/05/06